Members of NanOp

INSTITUT FÜR PHYSIKALISCHE HOCHTECHNOLOGIE (IPHT), Jena Applied Laser Technology Division, Dr. G. Andrä, Dr. F. Falk

IPHT is a R&D institution of the Federal State of Thuringia with 240 employees, 100 of them being scientists. In the Applied Laser Technology Division a group of 15, headed by Dr. Falk, is devoted to laser induced thin film deposition or modification.
Research and development focus on nano-crystalline Si (n-Si) films for opto-electronics. The preparation process is compatible with conventional silicon techno-logy and results in mechanically and chemically stable films.

Experience and present activities

• Deposition of thin films (a-Si, a-Si:H, SiC, CN_x, YSZ) by PECVD, laser CVD, and laser ablation.
• Laser chemical processing of thin films, laser crystallization of amorphous silicon films for solar cells or TFT's using Ar⁺, Cu-vapor, frequency doubled Nd:YAG, excimer, and CO₂ lasers.
• Preparation of nanocrystalline silicon (n-Si) thin films by laser irradiation of a-Si.